This laboratory is
aimed at the production of metal, semiconductor and dielectric
nanoparticles by means of advanced magnetron sputtering techniques, and
of thin nanocomposite films assembled by them.
The magnetron sputtering gas aggregation cluster source (Oxford Applied Research) is combined with a magnetron sputtering thin film deposition system (AJA) in one vacuum system. Metal, semiconductor and insulator nanoparticles can be combined with thin films (a-Si, SiN, SiO2 etc.). A sample transfer system enables the separate depositions at high vacuum at all times.
Referent: Marcel Di Vece